Low temperature electrochemical deposition of highly active elements

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Electrochemical deposition of patterning and highly luminescent organic films

This paper describes a simple electrochemical deposition (ED) technique to prepare luminescent and patterned films for light-emitting devices (LEDs). The luminescent films are deposited directly on the patterned ITO (indium tin oxide) electrodes through an oxidation coupling reaction of an electroactive and luminescent precursor. The ED films deposited on the ITO strips (width of 200 μm) exhibi...

متن کامل

Low-temperature growth of highly crystalline β-Ga2O3 nanowires by solid-source chemical vapor deposition

UNLABELLED Growing Ga2O3 dielectric materials at a moderately low temperature is important for the further development of high-mobility III-V semiconductor-based nanoelectronics. Here, β-Ga2O3 nanowires are successfully synthesized at a relatively low temperature of 610°C by solid-source chemical vapor deposition employing GaAs powders as the source material, which is in a distinct contrast to ...

متن کامل

Growth and Characterization of Thin MoS2 Films by Low- Temperature Chemical Bath Deposition Method

Transition metal dichalcogenide (TMDC) materials are very important inelectronic and optical integrated circuits and their growth is of great importance in thisfield. In this paper we present growth and fabrication of MoS2 (Molibdan DiSulfide)thin films by chemical bath method (CBD). The CBD method of growth makes itpossible to simply grow large area scale of the thin la...

متن کامل

Low Temperature Deposition SiO2 Films by SAPCVD

A Subatmospheric Pressure Chemical Vapor Deposition (SAPCVD) system was implemented for SiO2 nanometric films deposition on silicon substrates. Tetraethoxysilane (TEOS) and ozone (O3) were used as precursors and they were mixed into the SAPCVD system at 590 Torr. The deposition temperatures ranged from 140 to 265 o C and the deposition time ranged from 1 to 15 min. The measured thicknesses from...

متن کامل

Low-temperature thin-film deposition and crystallization.

Crystalline oxide films are important components in a wide array of electronic and optical devices, and their study and manufacture involve major aspects of current science and technology. A plethora of methods, such as sputtering, chemical vapor deposition, pulsed laser deposition, and sol-gel, are commonly used to deposit these films, and many new techniques are being developed (1). In each o...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Current Opinion in Solid State and Materials Science

سال: 2015

ISSN: 1359-0286

DOI: 10.1016/j.cossms.2014.11.006